Method for Improving Surface of Semiconductor Device

ABSTRACT

A method of forming a semiconductor structure includes forming a first top electrode (TE) layer over a magnetic tunnel junction (MTJ) layer and performing a smoothing treatment on the first TE layer. The smoothing treatment is performed in situ after the forming first TE layer. The smoothing treatment removes spike point defects from the first TE layer. Additional TE layers may be formed over the first TE layer.

PRIORITY CLAIM AND CROSS-REFERENCE

This application is a continuation of U.S. application Ser. No.17/339,785, filed on Jun. 4, 2021, entitled “Method for ImprovingSurface of Semiconductor Device,” which is a continuation of U.S.application Ser. No. 16/589,392, filed on Oct. 1, 2019, entitled “Methodfor Improving Surface of Semiconductor Device,” now U.S. Pat. No.11,031,236 issued Jun. 8, 2021, each application is hereby incorporatedherein by reference in its entirety.

BACKGROUND

Semiconductor devices are used in a variety of electronic applications,such as, for example, personal computers, cell phones, digital cameras,and other electronic equipment. Semiconductor devices are typicallyfabricated by sequentially depositing insulating or dielectric layers,conductive layers, and semiconductor layers of material over asemiconductor substrate, and patterning the various material layersusing lithography to form circuit components and elements thereon.

The semiconductor industry continues to increase the density ofelectronic components (e.g., transistors, diodes, resistors, capacitors,etc.) in integrated circuits (ICs) by innovations in semiconductortechnology such as, progressive reductions in minimum feature size,three-dimensional (3D) transistor structures (e.g., the fin field-effecttransistor (FinFET)), increasing the number of interconnect levels, andnon-semiconductor memory, such as ferroelectric random access memory(RAM) or FRAM, and magneto-resistive RAM or MRAM, within theinterconnect levels stacked above the semiconductor substrate. The basicstorage element of an MRAM is the magnetic-tunnel-junction (MTJ). A highcomponent density enables the System-on-Chip (SoC) concept whereinmultiple functional blocks, such as, central processing unit (CPU),cache memory (e.g., static RAM (SRAM)), analog/RF functions, andnonvolatile memory (e.g., Flash, FRAM, and MRAM) are integrated on asingle integrated circuit, often referred to as a chip. Integrating sucha diversity of functions on one chip often presents new challenges informing and integrating a concomitantly large variety of electroniccomponents and transistor structures.

Physical Vapor Deposition (PVD) and Chemical Vapor Deposition (CVD) arewidely used for deposition processes of the layers used in the formationof integrated circuits. In a PVD process or a CVD process, a wafer istypically placed in a vacuum chamber, and placed on an electrostaticchuck. When a PVD process is performed, a target is further placed overthe wafer. Process gases are introduced into the vacuum chamber. The PVDprocess or the CVD process may be accompanied by the generation ofplasma.

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of the present disclosure are best understood from the followingdetailed description when read with the accompanying figures. It isnoted that, in accordance with the standard practice in the industry,various features are not drawn to scale. In fact, the dimensions of thevarious features may be arbitrarily increased or reduced for clarity ofdiscussion.

FIG. 1 illustrates a cross-sectional view of a semiconductor substrateand multilevel interconnect structures of an integrated circuit, inaccordance with some embodiments.

FIGS. 2 through 8A illustrate cross-sectional views of an MRAM cellusing an MTJ storage element at various earlier stages of fabrication,in accordance with some embodiments. FIG. 8B illustrates cross-sectionalviews of a treatment chamber, in accordance with some embodiments.

FIGS. 9A through 9F illustrate various views of a plasma treatment on aconductive layer of a top electrode (TE) of an MTJ storage element, inaccordance with some embodiments.

FIGS. 10A through 10F illustrate various views of a nitrogen soak on aconductive layer of a TE of an MTJ storage element, in accordance withsome embodiments.

FIGS. 11A through 11E illustrate various embodiments of depositingconductive layers of a TE on an MTJ storage element, in accordance withsome embodiments.

FIG. 11F illustrates a microscopic view of conductive layers of a TE onan MTJ storage element, in accordance with some embodiments.

FIGS. 12 through 17 illustrate cross-sectional views of an MRAM cellusing an MTJ storage element at various later stages of fabrication, inaccordance with some embodiments.

DETAILED DESCRIPTION

The following disclosure provides many different embodiments, orexamples, for implementing different features of the invention. Specificexamples of components and arrangements are described below to simplifythe present disclosure. These are, of course, merely examples and arenot intended to be limiting. For example, the formation of a firstfeature over or on a second feature in the description that follows mayinclude embodiments in which the first and second features are formed indirect contact, and may also include embodiments in which additionalfeatures may be formed between the first and second features, such thatthe first and second features may not be in direct contact. In addition,the present disclosure may repeat reference numerals and/or letters inthe various examples. This repetition is for the purpose of simplicityand clarity and does not in itself dictate a relationship between thevarious embodiments and/or configurations discussed.

Further, spatially relative terms, such as “beneath,” “below,” “lower,”“above,” “upper” and the like, may be used herein for ease ofdescription to describe one element or feature's relationship to anotherelement(s) or feature(s) as illustrated in the figures. The spatiallyrelative terms are intended to encompass different orientations of thedevice in use or operation in addition to the orientation depicted inthe figures. The apparatus may be otherwise oriented (rotated 90 degreesor at other orientations) and the spatially relative descriptors usedherein may likewise be interpreted accordingly.

The present disclosure includes methods of forming, for example, a topelectrode (TE) of MTJ memory cells of an MRAM array. The TE refers to aconductive element used to electrically contact a topmost layer of anMTJ which may be a storage element of a cell in an MRAM array. Formationof high thickness TE films, such as e.g. TiN films, for TE fabricationperformed at high temperature with a long plasma deposition time cancause high grain size in the films. This high grain size may induce theformation of sharp points, or spike point defects, on the TE film. Highroughness of the TE film and spike point defects can impede deviceperformance. Advantageous features of the present disclosure'sembodiments include reducing spike point defects and increasing deviceperformance through different recipes including plasma treatments andsoaking treatments to eliminate sharp points in the TE film anddeposition of the TE film in multiple steps using low bias and high biaspower. While the present disclosure discusses aspects of methods offorming a conductive element in the context of forming a top electrodeof an MTJ memory cell, other embodiments may utilize aspects of thisdisclosure with other semiconductor fabrication processes.

FIG. 1 illustrates a cross-sectional view of a semiconductor structure100 comprising a semiconductor substrate 50 in which various electronicdevices may be formed, and a portion of a multilevel interconnect system(e.g., layers 100A and 100B) formed over the substrate 50, in accordancewith some embodiments. Generally, as will be discussed in greater detailbelow, FIG. 1 illustrates a FinFET device 60 formed on a substrate 50,with multiple interconnection layers formed thereover. As indicated bythe ellipsis at the top of FIG. 1 , multiple interconnect levels may besimilarly stacked in the fabrication process of an integrated circuit.

Generally, the substrate 50 illustrated in FIG. 1 may comprise a bulksemiconductor substrate or a silicon-on-insulator (SOI) substrate. AnSOI substrate includes an insulator layer below a thin semiconductorlayer that is the active layer of the SOI substrate. The semiconductorof the active layer and the bulk semiconductor generally comprise thecrystalline semiconductor material silicon, but may include one or moreother semiconductor materials such as germanium, silicon-germaniumalloys, compound semiconductors (e.g., GaAs, AlAs, InAs, GaN, AlN, andthe like), or their alloys (e.g., Ga_(x)Al_(1-x)As, Ga_(x)Al_(1-x)N,In_(x)Ga_(1-x)As and the like), oxide semiconductors (e.g., ZnO, SnO₂,TiO₂, Ga₂O₃, and the like) or combinations thereof. The semiconductormaterials may be doped or undoped. Other substrates that may be usedinclude multi-layered substrates, gradient substrates, or hybridorientation substrates.

The FinFET device 60 illustrated in FIG. 1 is a three-dimensional MOSFETstructure formed in fin-like strips of semiconductor protrusions 58referred to as fins. The cross-section shown in FIG. 1 is taken along alongitudinal axis of the fin in a direction parallel to the direction ofthe current flow between the source and drain regions 54. The fin 58 maybe formed by patterning the substrate using photolithography and etchingtechniques. For example, a spacer image transfer (SIT) patterningtechnique may be used. In this method a sacrificial layer is formed overa substrate and patterned to form mandrels using suitablephotolithography and etch processes. Spacers are formed alongside themandrels using a self-aligned process. The sacrificial layer is thenremoved by an appropriate selective etch process. Each remaining spacermay then be used as a hard mask to pattern the respective fin 58 byetching a trench into the substrate 50 using, for example, reactive ionetching (RIE). FIG. 1 illustrates a single fin 58, although thesubstrate 50 may comprise any number of fins.

Shallow trench isolation (STI) regions 62 formed along opposingsidewalls of the fin 58 are illustrated in FIG. 1 . STI regions 62 maybe formed by depositing one or more dielectric materials (e.g., siliconoxide) to completely fill the trenches around the fins and thenrecessing the top surface of the dielectric materials. The dielectricmaterials of the STI regions 62 may be deposited using a high densityplasma chemical vapor deposition (HDP-CVD), a low-pressure CVD (LPCVD),sub-atmospheric CVD (SACVD), a flowable CVD (FCVD), spin-on, and/or thelike, or a combination thereof. After the deposition, an anneal processor a curing process may be performed. In some cases, the STI regions 62may include a liner such as, for example, a thermal oxide liner grown byoxidizing the silicon surface. The recess process may use, for example,a planarization process (e.g., a chemical mechanical polish (CMP))followed by a selective etch process (e.g., a wet etch, or dry etch, ora combination thereof) that may recess the top surface of the dielectricmaterials in the STI region 62 such that an upper portion of fins 58protrudes from surrounding insulating STI regions 62. In some cases, thepatterned hard mask used to form the fins 58 may also be removed by theplanarization process.

In some embodiments, the gate structure 68 of the FinFET device 60illustrated in FIG. 1 is a high-k, metal gate (HKMG) gate structure thatmay be formed using a gate-last process flow. In a gate last processflow a sacrificial dummy gate structure (not shown) is formed afterforming the STI regions 62. The dummy gate structure may comprise adummy gate dielectric, a dummy gate electrode, and a hard mask. First adummy gate dielectric material (e.g., silicon oxide, silicon nitride, orthe like) may be deposited. Next a dummy gate material (e.g., amorphoussilicon, polycrystalline silicon, or the like) may be deposited over thedummy gate dielectric and then planarized (e.g., by CMP). A hard masklayer (e.g., silicon nitride, silicon carbide, or the like) may beformed over the dummy gate material. The dummy gate structure is thenformed by patterning the hard mask and transferring that pattern to thedummy gate dielectric and dummy gate material using suitablephotolithography and etching techniques. The dummy gate structure mayextend along multiple sides of the protruding fins and extend betweenthe fins over the surface of the STI regions 62. As described in greaterdetail below, the dummy gate structure may be replaced by the HKMG gatestructure 68 as illustrated in FIG. 1 . The HKMG gate structure 68illustrated in the right side in FIG. 1 (seen on the top of fin 58) isan example of an active HKMG gate structure which extends, e.g., alongsidewalls of and over a portion of fin 58 protruding above the STI 62,and the HKMG gate structure 68 in the left side in FIG. 1 is an examplegate structure extending over the STI region 62, such as betweenadjacent fins. The materials used to form the dummy gate structure andhard mask may be deposited using any suitable method such as CVD,plasma-enhanced CVD (PECVD), atomic layer deposition (ALD),plasma-enhanced ALD (PEALD) or the like, or by thermal oxidation of thesemiconductor surface, or combinations thereof.

Source and drain regions 54 and spacers 72 of FinFET 60, illustrated inFIG. 1 , are formed, for example, self-aligned to the dummy gatestructures. Spacers 72 may be formed by deposition and anisotropic etchof a spacer dielectric layer performed after the dummy gate patterningis complete. The spacer dielectric layer may include one or moredielectrics, such as silicon oxide, silicon nitride, silicon oxynitride,silicon carbide, silicon carbonitride, the like, or a combinationthereof. The anisotropic etch process removes the spacer dielectriclayer from over the top of the dummy gate structures leaving the spacers72 along the sidewalls of the dummy gate structures extending laterallyonto a portion of the surface of the fin (as illustrated in the rightside of FIG. 1 ) or the surface of the STI dielectric (as illustrated inthe left side of FIG. 1 ).

Source and drain regions 54 are semiconductor regions in direct contactwith the semiconductor fin 58. In some embodiments, the source and drainregions 54 may comprise heavily-doped regions and relativelylightly-doped drain extensions, or LDD regions. Generally, theheavily-doped regions are spaced away from the dummy gate structuresusing the spacers 72, whereas the LDD regions may be formed prior toforming spacers 72 and, hence, extend under the spacers 72 and, in someembodiments, extend further into a portion of the semiconductor belowthe dummy gate structure. The LDD regions may be formed, for example, byimplanting dopants (e.g., As, P, B, In, or the like) using an ionimplantation process.

The source and drain regions 54 may comprise an epitaxially grownregion. For example, after forming the LDD regions, the spacers 72 maybe formed and, subsequently, the heavily-doped source and drain regionsmay be formed self-aligned to the spacers 72 by first etching the finsto form recesses, and then depositing a crystalline semiconductormaterial in the recess by a selective epitaxial growth (SEG) processthat may fill the recess and, typically, extend beyond the originalsurface of the fin to form a raised source-drain structure, asillustrated in FIG. 1 . The crystalline semiconductor material may beelemental (e.g., Si, or Ge, or the like), or an alloy (e.g.,Si_(1-x)C_(x), or Si_(1-x)Ge_(x), or the like). The SEG process may useany suitable epitaxial growth method, such as e.g., vapor/solid/liquidphase epitaxy (VPE, SPE, LPE), or metal-organic CVD (MOCVD), ormolecular beam epitaxy (MBE), or the like. A high dose (e.g., from about10¹⁴ cm⁻² to 10¹⁶ cm⁻²) of dopants may be introduced into theheavily-doped source and drain regions 54 either in situ during SEG, orby an ion implantation process performed after the SEG, or by acombination thereof.

A first interlayer dielectric (ILD) 76 (seen in FIG. 1 ) is depositedover the structure. In some embodiments, a contact etch stop layer(CESL) (not shown) of a suitable dielectric (e.g., silicon nitride,silicon carbide, or the like, or a combination thereof) may be depositedprior to depositing the ILD material. A planarization process (e.g.,CMP) may be performed to remove excess ILD material and any remaininghard mask material from over the dummy gates to form a top surfacewherein the top surface of the dummy gate material is exposed and may besubstantially coplanar with the top surface of the first ILD 76. TheHKMG gate structures 68, illustrated in FIG. 1 , may then be formed byfirst removing the dummy gate structures using one or more etchingtechniques, thereby creating recesses between respective spacers 72.Next, a replacement gate dielectric layer 66 comprising one moredielectrics, followed by a replacement conductive gate layer 64comprising one or more conductive materials, are deposited to completelyfill the recesses. Excess portions of the gate structure layers 64 and66 may be removed from over the top surface of first ILD 76 using, forexample a CMP process. The resulting structure, as illustrated in FIG. 1, may be a substantially coplanar surface comprising an exposed topsurface of first ILD 76, spacers 72, and remaining portions of the HKMGgate layers 66 and 64 inlaid between respective spacers 72.

A second ILD layer 78 may be deposited over the first ILD layer 76, asillustrated in FIG. 1 . In some embodiments, the insulating materials toform the first ILD layer 76 and the second ILD layer 78 may comprisesilicon oxide, phosphosilicate glass (PSG), borosilicate glass (BSG),boron-doped phosphosilicate glass (BPSG), undoped silicate glass (USG),a low dielectric constant (low-k) dielectric such as, fluorosilicateglass (FSG), silicon oxycarbide (SiOCH), carbon-doped oxide (CDO),flowable oxide, or porous oxides (e.g., xerogels/aerogels), or the like,or a combination thereof. The dielectric materials used to form thefirst ILD layer 76 and the second ILD layer 78 may be deposited usingany suitable method, such as CVD, physical vapor deposition (PVD), ALD,PEALD, PECVD, SACVD, FCVD, spin-on, and/or the like, or a combinationthereof.

The gate dielectric layer 66 includes, for example, a high-k dielectricmaterial such as oxides and/or silicates of metals (e.g., oxides and/orsilicates of Hf, Al, Zr, La, Mg, Ba, Ti, and other metals), siliconnitride, silicon oxide, and the like, or combinations thereof, ormultilayers thereof. In some embodiments, the conductive gate layer 64may be a multilayered metal gate stack comprising a barrier layer, awork function layer, and a gate-fill layer formed successively on top ofgate dielectric layer 66. Example materials for a barrier layer includeTiN, TaN, Ti, Ta, or the like, or a multilayered combination thereof. Awork function layer may include TiN, TaN, Ru, Mo, Al, for a p-type FET,and Ti, Ag, TaAl, TaAlC, TiAlN, TaC, TaCN, TaSiN, Mn, Zr, for an n-typeFET. Other suitable work function materials, or combinations, ormultilayers thereof may be used. The gate-fill layer which fills theremainder of the recess may comprise metals such as Cu, Al, W, Co, Ru,or the like, or combinations thereof, or multi-layers thereof. Thematerials used in forming the gate structure may be deposited by anysuitable method, e.g., CVD, PECVD, PVD, ALD, PEALD, electrochemicalplating (ECP), electroless plating and/or the like.

As illustrated in FIG. 1 , electrodes of electronic devices formed inthe substrate 50 may be electrically connected to conductive features ofa first interconnect level 100A using conductive connectors (e.g.,contacts 74) formed through the intervening dielectric layers. In theexample illustrated in FIG. 1 , the contacts 74 make electricalconnections to the source and drain regions 54 of FinFET 60. Contacts 74to gate electrodes are typically formed over STI regions 62. A separategate electrode 64 (shown in the left in FIG. 1 ) illustrates suchcontacts. The contacts may be formed using photolithography techniques.For example, a patterned mask may be formed over the second ILD 78 andused to etch openings that extend through the second ILD 78 to expose aportion of gate electrodes over STI regions 62, as well as etch openingsover the fins 58 that extend further, through the first ILD 76 and theCESL (not shown) liner below first ILD 76 to expose portions of thesource and drain regions 54. In some embodiments, an anisotropic dryetch process may be used wherein the etching is performed in twosuccessive steps. The etchants used in the first step of the etchprocess have a higher etch rate for the materials of the first andsecond ILD layers 76 and 78 relative to the etch rate for the materialsused in the gate electrodes 64 and the CESL, which may be lining the topsurface of the heavily-doped regions of the source and drain regions 54.Once the first step of the etch process exposes the CESL, the secondstep of the etch process may be performed wherein the etchants may beswitched to selectively remove the CESL.

In some embodiments, a conductive liner may be formed in the openings inthe first ILD layer 76 and the second ILD layer 78. Subsequently, theopenings are filled with a conductive fill material. The liner comprisesbarrier metals used to reduce out-diffusion of conductive materials fromthe contacts 74 into the surrounding dielectric materials. In someembodiments, the liner may comprise two barrier metal layers. The firstbarrier metal comes in contact with the semiconductor material in thesource and drain regions 54 and may be subsequently chemically reactedwith the heavily-doped semiconductor in the source and drain regions 54to form a low resistance ohmic contact, after which the unreacted metalmay be removed. For example, if the heavily-doped semiconductor in thesource and drain regions 54 is silicon or silicon-germanium alloysemiconductor, then the first barrier metal may comprise Ti, Ni, Pt, Co,other suitable metals, or their alloys. The second barrier metal layerof the conductive liner may additionally include other metals (e.g.,TiN, TaN, Ta, or other suitable metals, or their alloys). A conductivefill material (e.g., W, Al, Cu, Ru, Ni, Co, alloys of these,combinations thereof, and the like) may be deposited over the conductiveliner layer to fill the contact openings, using any acceptabledeposition technique (e.g., CVD, ALD, PEALD, PECVD, PVD, ECP,electroless plating, or the like, or any combination thereof). Next, aplanarization process (e.g., CMP) may be used to remove excess portionsof all the conductive materials from over the surface of the second ILD78. The resulting conductive plugs extend into the first and second ILDlayers 76 and 78 and constitute contacts 74 making physical andelectrical connections to the electrodes of electronic devices, such asthe tri-gate FinFET 60 illustrated in FIG. 1 . In this example, contactsto electrodes over STI 62 and to electrodes over fins 58 are formedsimultaneously using the same processing steps. However, in otherembodiments these two types of contacts may be formed separately.

As illustrated in FIG. 1 , multiple interconnect levels may be formed,stacked vertically above the contact plugs 74 formed in the first andsecond ILD layers 76 and 78, in accordance with a back end of line(BEOL) scheme adopted for the integrated circuit design. In the BEOLscheme illustrated in FIG. 1 , various interconnect levels have similarfeatures. However, it is understood that other embodiments may utilizealternate integration schemes wherein the various interconnect levelsmay use different features. For example, the contacts 74, which areshown as vertical connectors, may be extended to form conductive lineswhich transport current laterally.

In this disclosure, the second interconnect level comprises conductivevias and lines embedded in an intermetal dielectric (IMD) layer. Inaddition to providing insulation between various conductive elements, anIMD layer may include one or more dielectric etch stop layers to controlthe etching processes that form openings in the IMD layer. Generally,vias conduct current vertically and are used to electrically connect twoconductive features located at vertically adjacent levels, whereas linesconduct current laterally and are used to distribute electrical signalsand power within one level. In the BEOL scheme illustrated in FIG. 1 ,conductive vias 104A connect contacts 74 to conductive lines 108A and,at subsequent levels, vias connect lower lines to upper lines (e.g., apair of lines 108A and 108B can be connected by via 104B). Otherembodiments may adopt a different scheme. For example, vias 104A may beomitted from the second level and the contacts 74 may be configured tobe directly connected to lines 108A.

Still referring to FIG. 1 , the first interconnect level 100A may beformed using, for example, a dual damascene process flow. First, adielectric stack used to form IMD layer 110A may be deposited using oneor more layers of the dielectric materials listed in the description ofthe first and second ILD layers 76 and 78. In some embodiments, IMDlayer 110A includes an etch stop layer (not shown) positioned at thebottom of the dielectric stack. The etch stop layer comprises one ormore insulator layers (e.g., SiN, SiC, SiCN, SiCO, CN, combinationsthereof, or the like) having an etch rate different than an etch rate ofan overlying material. The techniques used to deposit the dielectricstack for IMD may be the same as those used in forming the first andsecond ILD layers 76 and 78.

Appropriate photolithography and etching techniques (e.g., anisotropicRIE employing fluorocarbon chemistry) may be used to pattern the IMDlayer 110A to form openings for vias and lines. The openings for viasmay be vertical holes extending through IMD layer 110A to expose a topconductive surface of contacts 74, and openings for lines may belongitudinal trenches formed in an upper portion of the IMD layer 110A.In some embodiments, the method used to pattern holes and trenches inIMD 110A utilizes a via-first scheme, wherein a first photolithographyand etch process form holes for vias, and a second photolithography andetch process form trenches for lines. Other embodiments may use adifferent method, for example, a trench-first scheme, or an incompletevia-first scheme, or a buried etch stop layer scheme. The etchingtechniques may utilize multiple steps. For example, a first main etchstep may remove a portion of the dielectric material of IMD layer 110Aand stop on an etch stop dielectric layer. Then, the etchants may beswitched to remove the etch stop layer dielectric materials. Theparameters of the various etch steps (e.g., chemical composition, flowrate, and pressure of the gases, reactor power, etc.) may be tuned toproduce tapered sidewall profiles with a desired interior taper angle.

Several conductive materials may be deposited to fill the holes andtrenches forming the conductive features 104A and 108A of the firstinterconnect level 100A. The openings may be first lined with aconductive diffusion barrier material and then completely filled with aconductive fill material deposited over the conductive diffusion barrierliner. In some embodiments, a thin conductive seed layer may bedeposited over the conductive diffusion barrier liner to help initiatean electrochemical plating (ECP) deposition step that completely fillsthe openings with a conductive fill material.

The diffusion barrier conductive liner in the vias 104A and lines 108Acomprises one or more layers of TaN, Ta, TiN, Ti, Co, or the like, orcombinations thereof. The conductive fill layer in 104A and 108A maycomprise metals such as Cu, Al, W, Co, Ru, or the like, or combinationsthereof, or multi-layers thereof. The conductive materials used informing the conductive features 104A and 108A may be deposited by anysuitable method, for example, CVD, PECVD, PVD, ALD, PEALD, ECP,electroless plating and the like. In some embodiments, the conductiveseed layer may be of the same conductive material as the conductive filllayer and deposited using a suitable deposition technique (e.g., CVD,PECVD, ALD, PEALD, or PVD, or the like).

Any excess conductive material over the IMD 110A outside of the openingsmay be removed by a planarizing process (e.g., CMP) thereby forming atop surface comprising dielectric regions of IMD 110A that aresubstantially coplanar with conductive regions of 108A. Theplanarization step embeds the conductive vias 104A and conductive lines108A into IMD 110A, as illustrated in FIG. 1 .

The interconnect level positioned vertically above the firstinterconnect level 100A in FIG. 1 , is the second interconnect level100B. In some embodiments, the structures of the various interconnectlevels (e.g., the first interconnect level 100A and the secondinterconnect level 100B) may be similar. In the example illustrated inFIG. 1 , the second interconnect level 100B comprises conductive vias104B and conductive lines 108B embedded in an insulating film IMD 110Bhaving a planar top surface. The materials and processing techniquesdescribed above in the context of the first interconnect level 100A maybe used to form the second interconnect level 100B and subsequentinterconnect levels.

Although an example electronic device (FinFET 60) and exampleinterconnect structures making connections to the electronic device aredescribed, it is understood that one of ordinary skill in the art willappreciate that the above examples are provided for illustrativepurposes only to further explain applications of the presentembodiments, and are not meant to limit the present embodiments in anymanner.

FIG. 2 illustrates a detailed view of region 101 of FIG. 1 , showing aninterconnect level 100B at an initial stage of fabrication of the MRAMarray. In FIG. 2 , a conductive line 108B at the interconnect level 100Bhas been illustrated as the conductive feature to which a bottomelectrode (BE) of an MTJ memory cell will be electrically coupled at asubsequent processing step, in accordance with some embodiments. Theconductive line 108B is shown for illustrative purposes only; it isunderstood that the BE and MTJ memory cell may be formed on a conductiveline in any metallization layer suitable in a particular design. In FIG.2 , a via 104B and a conductive line 108B are shown embedded in aninsulating film IMD 110B. The top dielectric surface of IMD 110B isshown to be substantially coplanar with the top conductive surface ofconductive line 108B, within process variations.

FIG. 3 illustrates a dielectric stack 200 comprising one or moredielectric layers formed successively over the interconnect level 100Bin accordance with some embodiments. In some embodiments, the dielectricstack 200 may be positioned between a subsequently formed MRAM cell andthe conductive line 108B. A first dielectric layer 202 may be formedover the planarized top surface of the interconnect level 100B, and asecond dielectric layer 204 formed over first dielectric layer 202. Inthe example structure illustrated in FIG. 3 , the first and seconddielectric layers 202 and 204 may be used collectively as an etch stoplayer during a subsequent etching step used to form vertical holesextending through the dielectric stack 200. In some embodiments, thefirst and second dielectric layers 202 and 204 comprise AlN and AlO_(x),respectively, although other dielectric materials (e.g., SiN, SiC,and/or the like, or a combination thereof) may be used. In someembodiments, the first dielectric layer 202 may have a thickness fromabout 10 Å to about 1000 Å, and the second dielectric layer 204 may havea thickness from about 10 Å to about 1000 Å.

Still referring to FIG. 3 , a third dielectric layer 206, formed overthe second dielectric layer 204, provides insulation between conductiveline 108B and the subsequently formed BE of an MTJ memory cell of anMRAM array. In this example, the third dielectric layer 206 may comprisea silicon oxide deposited using, for example, a CVD technique withtetraethyl orthosilicate (TEOS) as a precursor. Other embodiments mayuse other insulators, for example, PSG, BSG, BPSG, USG, FSG, SiOCH, CDO,flowable oxide, or porous oxides (e.g., xerogels/aerogels), or the like,or a combination thereof. In some embodiments, the third dielectriclayer 206 may have a thickness from about 50 Å to about 1000 Å.

FIG. 3 further illustrates an anti-reflective coating (ARC) 208overlying the third dielectric layer 206 of the example dielectric stack200, and a patterned photoresist layer 209 overlying the ARC 208.Anti-reflective coatings improve photo resolution by reducing opticaldistortions associated with specular reflections, thin-filminterference, and/or standing waves that may inhibit sharp featuredefinition during imaging of photoresist material. In the illustratedexample, the ARC 208 may comprise a nitrogen-free ARC (NFARC) (e.g., anorganic ARC, such as C_(x)H_(x)O_(x), or inorganic ARC, such as SiC) tofurther improve feature definition during patterning of photoresistlayer 209. In some embodiments, the ARC 208 may have a thickness fromabout 50 Å to about 1000 Å. The various dielectric layers of dielectricstack 200 may be formed by any suitable deposition technique, e.g., CVD,PECVD, ALD, PEALD, PVD, spin-on and/or the like, or a combinationthereof. The structure of the dielectric stack 200 is provided asexample only; other insulating structures may be utilized.

FIG. 4 illustrates a hole 203 extending through the dielectric stack 200to expose a portion of the conductive top surface of the conductive line108B inlaid in the insulating film IMD 110B. The dielectric stack 200may be patterned using the patterned photoresist layer 209 as an etchmask to etch holes 203. Any acceptable etching technique may be used,for example, RIE processes described earlier with reference to FIG. 1used to form vias and lines such as the via 104B and the conductive line108B. The etching process may include one or more etching steps, forexample, a first etch step may be performed using etchants to remove anexposed portion of the ARC layer 208, and a second etch step may beperformed using etchants that remove the third dielectric layer 206 butleave the first and second dielectric layers 202 positioned below thethird dielectric layer 206 relatively unetched. A third etch step mayremove an exposed portion of the first and second dielectric layers 202and 204 and expose a portion of the top conductive surface of conductiveline 108B, as illustrated in FIG. 4 . In some embodiments, the first andsecond etch steps may be the same step.

FIG. 5 illustrates a BE via 205 formed in the dielectric stack 200 andelectrically connected to conductive line 108B. The BE via 205 maycomprise one or more layers. For example, the hole 203 (see FIG. 4 ) maybe filled with a conductive diffusion barrier liner and a conductivefill material filling the hole 203. A planarizing process (e.g., CMP)may be performed to remove excess conductive material from over the topsurface of the dielectric stack 200 to form a dielectric surface that issubstantially coplanar with the top conductive surface of the BE via205, as illustrated in FIG. 5 .

In some embodiments, (including the example illustrated in FIG. 5 ) thematerials and processing techniques used to form the BE via 205 may bethe same as those used to form vias at the interconnect levels describedabove (e.g., 104A and 104B). In other embodiments, the conductivematerials and processes used to form BE via 205 may be different fromthe conductive materials and processes used to form the conductivefeatures of the interconnect levels formed in prior, or subsequent,processing steps. For example, Cu may be used as the conductive fillmaterial in 104A and 104B, while TiN may be used as the conductive fillmaterial in BE via 205. In another embodiment, another conductivematerial such as Co may be used as the conductive fill material in BEvia 205.

FIG. 6 illustrates a conductive BE layer 210 formed vertically adjacentto the top surface of the BE via 205 and the dielectric stack 200. Insome embodiments, the BE layer 210 comprises multiple layers ofconductive materials deposited successively, as illustrated in FIG. 6 .For example, a conductive layer 212 comprising, for example, TaN may beformed on the top surface of the dielectric stack 200 and the BE via205, and a conductive layer 214 comprising, for example, TiN may beformed over the conductive layer 212, in accordance with someembodiments. In other embodiments, the BE layer 210 may include eithermore or less than two conductive layers, and may use other conductivematerials (e.g., Cu, Al, Ta, W, Ti, or the like). The first and secondconductive layers 212 and 214 may be deposited using any suitabletechnique, such as CVD, ALD, PECVD, PEALD, or PVD, or the like, or acombination thereof. In some embodiments, the first conductive layer 212may have a thickness from about 10 Å to about 500 Å, and the secondconductive layer 214 may have a thickness from about 10 Å to about 500Å. The top surface of BE layer 210 may be planarized using, for example,a CMP process, in accordance with some embodiments.

FIG. 7 illustrates a multilayered MTJ layer 220 formed verticallyadjacent to the top surface of the BE layer 210. The MTJ may be formedby depositing a plurality of conductive and dielectric layers,collectively referred to as MTJ layer 220. The multilayered MTJ layer220 formed over the BE layer 210 may include various layers formed ofdifferent combinations of materials. In an example embodiment, MTJ layer220 includes a pinning layer 222, a tunnel barrier layer 224, and a freelayer 226, formed successively. In an example embodiment, the pinninglayer 222 is formed of PtMn, the tunnel barrier layer 224 is formed ofMgO over the pinning layer 222, and the free layer 226 is formed ofCo_(x)Fe_(y)B_(1-x-y) alloy over the MgO tunnel barrier layer 224. Insome embodiments, MTJ layer 220 may use other materials, such as, alloysof Mn with a metal other than Pt (e.g., IrMn, RhMn, NiMn, PdPtMn, orFeMn) to form a pinning layer 222, other dielectrics (e.g., AlO_(x)) toform a tunnel barrier layer 224, and CoFe_(y)B_(1-x-y) alloy to form thefree layer 226. In addition, MTJ layer 220 may have other variationsincluding other layers, such as anti-ferromagnetic layers (e.g., amultilayered [Co/Pt]_(n) synthetic anti-ferromagnetic (SyAF) layer,etc.). The materials for the MTJ layer 220 may be deposited using one ormore techniques, such as CVD, PECVD, PVD, ALD, or PEALD, or the like, ora combination thereof. In some embodiments, the tunnel barrier layer 224may be formed by depositing a metal and then oxidizing the metal toconvert the metal to a dielectric using, for example, a plasma oxidationtechnique. It should be recognized that the MTJ layer 220 may have manyvariations, which are also within the scope of the present disclosure.

FIG. 8A illustrates a first conductive layer 232 formed over themultilayered MTJ layer 220 as a first stage in a formation of a topelectrode (TE). The multilayered MTJ layer 220 in FIG. 8A is verticallyinterposed between the BE layer 210 and the first conductive layer 232of the TE, and both physically and electrically in contact with the BElayer 210 and first conductive layer 232 of the TE at their respectiveinterfaces. The bottom conductive surface of the first conductive layer232 of the TE is shown physically and electrically in contact with thetop conductive free layer 226 of the MT layer 220. The example firstconductive layer 232 of the TE in FIG. 8A comprises TiN, in accordancewith some embodiments. In other embodiments, the first conductive layer232 of the TE may use other conductive materials (e.g., Cu, Al, W, Ti,or the like). The first conductive layer 232 may be formed after adegassing is performed. The first conductive layer 232 may be formed tohave a thickness between about 10 nm and about 200 nm. The deposition ofthe first conductive layer 232 may be performed at a process temperaturebetween about 200° C. and about 400° C., in a chamber pressure ofbetween about 10 mtorr to about 1000 mtorr, over a processing timebetween about 10 seconds and 1000 seconds, using a DC plasma power (asmeasured at the power supply) between about 5 KW and about 30 KW, and abias power between about 20 W and about 100 W.

FIG. 8A further illustrates spike points 231 on the surface of the firstconductive layer 232. Spike points 231 may be induced due to high grainsize, e.g. between about 12 nm and about 25 nm, formed in the firstconductive layer 232 by the long plasma deposition time (between about10 seconds and about 1000 seconds) and high temperature (between about200° C. and about 500° C.) needed for the deposition of a high thicknessfilm with a thickness between about 10 nm and about 500 nm.

FIG. 8B illustrates a treatment chamber 350 in which the firstconductive layer 232 may be formed on MTJ layer 220 using a depositionprocess such as PVD. The deposition process may be performed at a lowerpressure and/or with a lower bias power than a later RF plasmatreatment, as described below in reference to FIGS. 9A-F. The treatmentchamber 350 may comprise a grounding strip 310, a grounding bracket 320,an electrostatic chuck 330, a first shield 340, a second shield 344, anda target 360. The semiconductor structure 100 is disposed on theelectrostatic chuck 330 with the MTJ layer 220 exposed on its topsurface.

FIGS. 9A through 9F illustrate a method for reducing the spike points231 with an RF plasma treatment, in accordance with some embodiments.FIG. 9A illustrates an RF plasma treatment 300 applied to the firstconductive layer 232 after the deposition of the first conductive layer232. The RF plasma treatment 300 may be performed in situ after thedeposition of the first conductive layer 232.

FIG. 9B illustrates an embodiment of the RF plasma treatment 300 beingperformed in the treatment chamber 350. In an embodiment, the RF plasmatreatment 300 is an AC bias plasma treatment. The semiconductorstructure 100 is disposed on the electrostatic chuck 330 with the firstconductive layer 232 exposed on its top surface. The treatment gas 302enters the treatment chamber 350 following the path indicated in FIG. 9Band is excited into a RF plasma 304. The RF plasma 304 bombards the topsurface of the semiconductor structure 100 as illustrated in FIG. 9B.The treatment gas 302 may be a suitable gas such as N₂, Ar, H₂, O₂, orthe like. In an embodiment, the treatment gas 302 is N₂ and theresulting RF plasma 304 is a nitrogen plasma. The treatment gas 302 maybe supplied at a flow rate of between about 50 sccm to about 2000 sccm,while the RF plasma treatment 300 is performed at a pressure of betweenabout 10 mtorr to about 1000 mtorr. The AC bias power of the RF plasmatreatment 300 may be between about 10 W to about 1000 W, as measured atthe power supply output.

However, the RF plasma treatment may be performed at a higher pressureand/or with higher bias power than the first conductive layer 232, asdescribed above in reference to FIGS. 8A and 8B. For example, in anembodiment in which the deposition of the first conductive layer 232 isperformed at a pressure of about 10 mtorr, the RF plasma treatment maybe performed at a higher pressure, such as being performed at a pressureof about 1000 mtorr. Similarly, in an embodiment in which the depositionof the first conductive layer 232 is performed at a bias power of 20 W,the RF plasma treatment may be performed at a higher bias power, such asa bias power of about 1000 W. However, any suitable combination ofpressures and biases may be utilized.

The RF plasma treatment 300 may be performed at a temperature betweenabout 200° C. to about 400° C. It is advantageous for the flow rate tobe at least about 50 sccm in order to provide sufficient N₂ to formplasma, and it is advantageous for the flow rate to be about 2000 sccmor less because exceeding 2000 sccm may cause an arcing issue byoverproduction of plasma. It is advantageous for the AC bias power to beat least about 10 W because the AC bias can control the film quality,and it is advantageous for the flow rate to be about 1000 W or lessbecause higher AC bias can cause an arcing issue. It is advantageous forthe temperature to be at least about 200° C. in order to keep plasmadensity, and it is advantageous for the temperature to be about 400° C.or less because higher temperatures may cause an arcing issue.

FIGS. 9C, 9D, and 9E illustrate the action of the RF plasma treatment300 on the first conductive layer 232, in accordance with someembodiments. FIG. 9C illustrates a cross section of a portion of the topsurface of the first conductive layer 232, showing the ionic structureof cations C and anions A. In embodiments where the first conductivelayer 232 consists substantially of TiN, the cations C are Ti atoms andthe anions A are N atoms. In FIG. 9D, the RF plasma treatment 300 isperformed by bombarding the first conductive layer 232 with the RFplasma 304. FIG. 9E illustrates the result after the RF plasma treatment300 has been performed. Irregularities in the top surface of the firstconductive layer 232 have been removed. In embodiments where the firstconductive layer 232 consists substantially of TiN and the RF plasma 304comprises an N₂ plasma, N atoms may fill gaps in the TiN latticestructure. The RF plasma treatment 300 can also remove surface particleson the first conductive layer 232. The RF plasma treatment 300 may causea reduction in the height of the first conductive layer 232.

FIG. 9F illustrates the end result of applying the RF plasma treatment300. The first conductive layer 232 with spike points 231, asillustrated above in FIG. 9A, has been converted to a smoothed firstconductive layer 232′. The spike points 231 have been removed by the RFplasma treatment 300 in FIGS. 9A, 9B, and 9D. The smoothed firstconductive layer 232′ may have a strongly defined crystallographicdirection (200). The resulting order of diffraction n of the smoothedfirst conductive layer 232′ may be greater than 1.4, where n is theorder of diffraction in Bragg's law 2d sin θ=nλ.

The smoothed first conductive layer 232′ produced by the RF plasmatreatment 300 has a flatter top surface without spike points 231. The RFplasma treatment 300 may also remove surface particles adhering to thetop surface. By removing these defect causing structures, increasedyields and performance can be achieved.

FIGS. 10A through 10F illustrate another embodiment of a method forreducing the spike points 231 with a gaseous soak treatment, inaccordance with some embodiments. FIG. 10A illustrates a gaseous soaktreatment 400 applied to the first conductive layer 232 after thedeposition of the first conductive layer 232. The gaseous soak treatment400 comprises gas 402 and excited atoms 404. The gaseous soak treatment400 may be performed in situ after the deposition of the firstconductive layer 232. In an embodiment, gas 402 comprises N₂ and theexcited atoms 404 comprise excited N atoms. In other embodiments, gas402 may comprise NH₃ and the excited atoms 404 may comprise excited Natoms.

FIG. 10B illustrates an embodiment of the gaseous soak treatment 400being performed in the treatment chamber 350. The semiconductorstructure 100 is disposed on the electrostatic chuck 330 with the firstconductive layer 232 exposed on its top surface. The gas 402 enters thetreatment chamber 350 following the path indicated in FIG. 10B. The gas402 may be supplied at a flow rate of between about 10 sccm to about2000 sccm. The gaseous soak treatment 400 may be performed at a pressurein a range between about 10 mTorr to about 400 mTorr. The gaseous soaktreatment 400 may be performed at a temperature between about 200° C. toabout 600° C. It is advantageous for the flow rate to be at least about10 sccm in order to form plasma, and it is advantageous for the flowrate to be about 2000 sccm or less because exceeding 2000 sccm may causean arcing issue by overproduction of plasma. It is advantageous for thepressure to be at least about 10 mTorr because this pressure may allowthe formation of sufficient plasma, and it is advantageous for thepressure to be about 400 mtorr or less because exceeding 400 mtorr maycause short mean free paths of the gas particles, reducing depositionrate and film quality. It is advantageous for the temperature to be atleast about 200° C. in order to maintain plasma density, and it isadvantageous for the temperature to be about 600° C. or less becausehigher temperatures may cause an arcing issue. During the gaseous soaktreatment 400, a portion of the atoms from the gas 402 are excited byincreasing temperature in the treatment chamber 350. The excited atoms404 interact with the top surface of the first conductive layer 232.

FIGS. 10C through 10E illustrate the operation of the gaseous soaktreatment 400. FIG. 10C illustrates a cross section of a portion of thetop surface of the first conductive layer 232, showing the ionicstructure of cations C and anions A. In embodiments where the firstconductive layer 232 consists substantially of TiN, the cations C are Tiatoms and the anions A are N atoms. In FIG. 10D, the gaseous soaktreatment 400 is performed by exposing the first conductive layer 232 tothe gas 402 and the excited atoms 404. FIG. 10E illustrates the resultafter the gaseous soak treatment 400 has been performed. Irregularitiesin the top surface of the first conductive layer 232 have been removed.The excited atoms 404 have filled gaps in the lattice structure of thetop surface of the first conductive layer 232, resulting in an evendistribution across the top surface of the first conductive layer 232.In embodiments where the first conductive layer 232 consistssubstantially of TiN and where the excited atoms 404 comprise excited Natoms, the excited N atoms 404 may fill gaps in the TiN latticestructure.

FIG. 10F illustrates the end result of applying the gaseous soaktreatment 400. A smoothed conductive layer 232″ has been formed on thefirst conductive layer 232. The spike points 231, as illustrated abovein FIG. 10A, have been covered by the smooth conductive layer 232″. Thesmoothed first conductive layer 232″ may have a strongly definedcrystallographic direction (200).

FIGS. 11A through 11E illustrate embodiments of methods for depositingmultiple sublayers of the first conductive layer 232 using a processsuch as PVD with low and high bias power applied. The resulting mixedhigh/low bias films may have substantially flatter top surfaces devoidof sharp points. FIG. 11A illustrates an embodiment of a method 1000 inwhich a low bias sublayer 232 a is formed with a lower bias power. Thelow bias sublayer 232 a is then covered by a high bias sublayer 232 bbeing formed with a higher bias power.

In more detail, a pre-deposition process, or pre-step, may be performedin step 1010 to prepare the top surface of the MTJ for deposition whilede-gassing the treatment chamber 350. No deposition is performed duringthe pre-step. The pre-step may be performed for between about 10 secondsand about 100 seconds at a temperature of between about 300° C. andabout 400° C.

Next, FIG. 11A further illustrates the formation of the low biassublayer 232 a in step 1020. In some embodiments, the low bias sublayer232 a comprises TiN. The low bias sublayer 232 a may be formed at atemperature of between about 300° C. and about 400° C., in a chamberpressure of between about 10 mtorr to about 1000 mtorr, such as betweenabout 100 mtorr to about 500 mtorr, and over a processing time betweenabout 10 seconds and 1000 seconds. The low bias sublayer 232 a may beformed using a DC plasma power (as measured at the power supply) betweenabout 0 KW and about 30 KW, such as between about 0 KW and about 5 KW,and using a bias power between about 0 W and about 1000 W, such asbetween about 0 W and about 30 W. It is advantageous for the temperatureto be at least about 300° C. in order to maintain plasma density, and itis advantageous for the temperature to be about 400° C. or less becausetemperature exceeding 400° C. may cause an arcing issue. It isadvantageous for the chamber pressure to be at least about 10 mtorr inorder to form the low bias sublayer 232 a, and it is advantageous forthe chamber pressure to be about 1000 mtorr or less because exceeding1000 mtorr may cause short mean free paths of the plasma particles,reducing deposition rate and film quality. It is additionallyadvantageous for the chamber pressure to be in a range between about 100mtorr to about 500 mtorr because controlling the chamber pressure inthis range may achieve uniform film quality. It is advantageous for theprocessing time to be about 10 seconds or more in order to form the lowbias sublayer 232 a, and it is advantageous for the processing time tobe about 1000 seconds or less because 1000 seconds may be sufficient toform the low bias sublayer 232 a. It is advantageous for the DC plasmapower to be about 30 KW or less in order to form plasma, and it isadditionally advantageous for the DC plasma power to be about 5 KW orless in order to form the low bias sublayer 232 a. It is advantageousfor the bias power to be about 1000 W or less in order to form a highstress film, and it is additionally advantageous for the bias power tobe about 30 W or less because higher AC power may cause an arcing issue.The low bias sublayer 232 a may be formed to have a thickness betweenabout 1 nm and 100 nm.

After the formation of the low bias sublayer 232 a, FIG. 11A furtherillustrates the formation of the high bias sublayer 232 b in step 1030.The high bias sublayer 232 b may comprise TiN. The high bias sublayer232 b may be formed at a temperature of between about 300° C. and about400° C., in a chamber pressure of between about 10 mtorr to about 1000mtorr, such as between about 100 mtorr to about 500 mtorr, and over aprocessing time between about 10 seconds and 500 seconds. It isadvantageous for the temperature to be at least about 300° C. in orderto maintain plasma density, and it is advantageous for the temperatureto be about 400° C. or less because exceeding 400° C. may cause anarcing issue. It is advantageous for the chamber pressure to be at leastabout 10 mtorr in order to form the high bias sublayer 232 b, and it isadvantageous for the chamber pressure to be about 1000 mtorr or lessbecause exceeding 1000 mtorr may cause short mean free paths of theparticles, reducing deposition rate and film quality. It is additionallyadvantageous for the chamber pressure to be between about 100 mtorr toabout 500 mtorr because controlling the chamber pressure in this rangemay achieve uniform film quality. It is advantageous for the processingtime to be between about 10 seconds and about 500 seconds in order toform the high bias sublayer 232 b to a thickness of between about 10 nmand about 2000 nm.

The high bias sublayer 232 b may be formed using a DC plasma powerbetween about 0 KW and about 30 KW, such as between about 5 KW and about20 KW, higher than the DC plasma power used to form the low biassublayer 232 a. The difference between the DC plasma powers used to formthe low bias sublayer 232 a and the high bias sublayer 232 b may bebetween about 1000 W and about 5000 W. It is advantageous for the DCplasma power to be about 30 KW or less in order to form plasma, and itis additionally advantageous for the DC plasma power to be controlledbetween about 5 KW and about 20 KW in order to achieve the high biassublayer 232 b. The high bias sublayer 232 b may be formed using a biaspower between about 0 W and about 1000 W, such as between about 20 W andabout 100 W, higher than the bias power used to form the low biassublayer 232 a. The difference between the bias powers used to form thelow bias sublayer 232 a and the high bias sublayer 232 b may be betweenabout 1000 W and about 5000 W. It is advantageous for the bias power tobe about 1000 W or less because a higher bias power may form acompressive film, and it is additionally advantageous for the bias powerto be between about 20 W and about 100 W in order to achieve a minimalstress film. The difference between the thicknesses of the low biassublayer 232 a and the high bias sublayer 232 b may be between about 5nm and about 2000 nm.

After the formation of the high bias sublayer 232 b, FIG. 11A furtherillustrates in step 1040 that a post-deposition process, or post-step,may be performed. The post-step comprises de-gassing and cooling thetreatment chamber 350 to prepare the top surface of the high biassublayer 232 b for the next step of the process. No deposition isperformed during the post-step. The post-step may be performed forbetween about 1 second and 30 seconds at a temperature of between about10° C. and about 100° C.

X-ray diffraction analysis of the first conductive layer 232 formed fromthe low bias sublayer 232 a covered by the high bias sublayer 232 bindicates intensity peaks at crystallographic directions (111) and(200). This may show that the embodiment illustrated in FIG. 11A of theformation of a low bias sublayer 232 a and the subsequent formation of ahigh bias sublayer 232 b produces a substantially flat first conductivelayer 232 without significant spike points on its top surface. Theprevention of the spike points may increase device performance.

FIG. 11B illustrates the result of the method embodiment illustrated byFIG. 11A. As can be seen, the low bias sublayer 232 a is disposed on themultilayered MJT layer 220. Additionally, by increasing the bias, thehigh bias sublayer 232 b is formed and disposed on the low bias sublayer232 a.

FIG. 11C illustrates the result of another embodiment which utilizes thelow bias sublayer 232 a and the high bias sublayer 232 b, but which alsoutilizes a second high bias sublayer 232 c over the high bias sublayer232 b. In an embodiment the second high bias sublayer 232 c may beformed using the same parameters as the high bias sublayer 232 b (andthereby simply increasing the thickness of the material of the high biassublayer 232 b), but in other embodiments the second high bias sublayer232C may be formed by modifying the bias yet again to be either higheror lower than the bias utilized for the high bias sublayer 232 b (whilestill being higher than the bias used to form the low bias sublayer 232a). As such, in one embodiment the second high bias sublayer 232C may beformed with a using a bias power between about 10 W and about 200 W,although any suitable bias may be utilized.

FIG. 11D illustrates the result of a different embodiment which utilizesthe low bias sublayer 232 a and the high bias sublayer 232 b, but whichalso utilizes a second low bias sublayer 232 d adjacent to the low biassublayer 232 a. In an embodiment the second low bias sublayer 232 d maybe formed using the same parameters as the low bias sublayer 232 a (andthereby simply increasing the thickness of the material of the low biassublayer 232 a), but in other embodiments the second low bias sublayer232 d may be formed by modifying the bias yet again to be either higheror lower than the bias utilized for the low bias sublayer 232 a (whilestill being lower than the bias used to form the high bias sublayer 232b). As such, in one embodiment the second low bias sublayer 232 d may beformed with a using a bias power between about 10 W and about 200 W,although any suitable bias may be utilized.

FIG. 11E illustrates the result of yet another embodiment in which thelow bias sublayer 232 a and the high bias sublayer 232 b are utilized.In this embodiment, however, the order of their formation is reversed sothat the high bias sublayer 232 b is formed first and then covered byforming the low bias sublayer 232 a over it. As such, the high biassublayer 232 b is adjacent to and in direct contact with the MTJ layer220.

Additionally, Applicant respectfully submits that the description of theembodiments described above for the use of the low bias sublayer 232 aand the high bias sublayer 232 b (along with the other layers described)is intended to be illustrative and is not intended to be limiting to theembodiments. Rather, any suitable combination of layers may be utilized.For example, in other embodiments, two low bias sublayers 232 a may beformed without any high bias sublayers 232 b being formed, or two highbias sublayers 232 b may be formed without any low bias sublayers 232 abeing formed. In still other embodiments, different numbers, orders, andcombinations of low bias sublayers 232 a and high bias sublayers 232 bmay be formed. All such combinations are fully intended to be includedwithin the scope of the embodiments.

In other embodiments, the formation of the low bias sublayer 232 a andhigh bias sublayer 232 b as illustrated in FIGS. 11A-B may be followedby the RF plasma treatment 300 illustrated in FIGS. 9A-F. In still otherembodiments, the formation of the low bias sublayer 232 a and the highbias sublayer 232 b as illustrated in FIGS. 11A-B may be followed by thegaseous soak treatment 400 illustrated in FIGS. 10A-F. Performing the RFplasma treatment 300 or the gaseous soak treatment 400 on the low biassublayer 232 a and high bias sublayer 232 b may further reduce or removeany spike points 231, increasing top surface flatness and improvingdevice performance.

FIG. 1F shows a spectroscopic analysis of the elements of the firstconductive layer 232 using the low bias sublayer 232 a and the high biassublayer 232 b. In this chart, line 2010 represents titanium (Ti), line2020 represents nitrogen (N), line 2030 represents gold (Au), line 2040represents copper (Cu), and line 2050 represents tantalum (Ta). Lines2010 and 2020, together indicating TiN, fall to zero right at the upperboundary of the top layer, indicating that no significant spike pointsof TiN exist above the upper boundary of the top layer.

FIG. 12 illustrates a top electrode (TE) layer 230 comprising severalconductive layers formed over the MTJ layer 220. The example TE layer230 in FIG. 12 comprises three conductive material layers: the firstconductive layer 232′ comprising TiN as formed in the embodimentillustrated in FIGS. 9A-F, a second conductive layer 234 comprising Ta,and a third conductive layer 236 comprising TaN formed sequentially, inaccordance with some embodiments. In other embodiments, the TE layer 230may comprise the first conductive layer 232″ as formed in the embodimentillustrated in FIGS. 10A-F, or the TE layer 230 may comprise the lowbias sublayer 232 a and high bias sublayer 232 b as illustrated in FIGS.11A-D, or the TE layer 230 may comprise the low bias sublayer 232 a andhigh bias sublayer 232 b after the RF plasma treatment 300 or thegaseous soak treatment 400 is performed. In still other embodiments, theTE layer 230 may include a different number of conductive layers, andmay use other conductive materials (e.g., Cu, Al, W, Ti, or the like).In these and other embodiments, the first conductive layer 232′, 232″,232 a and 232 b, or the like is substantially devoid of spike pointdefects with widths around 100 nm. The conductive layers 234 and 236 maybe deposited using any suitable technique, such as CVD, PECVD, ALD,PEALD, or PVD, or the like, or a combination thereof.

FIG. 13 illustrates a hard mask layer 238 deposited on top of the TElayer 230, and a photoresist layer 239 coated and patterned over thehard mask layer 238 using acceptable photolithography techniques. Thehard mask layer 238 may comprise a dielectric material, in accordancewith some embodiments. For example, the hard mask layer 238 may besilicon carbide (SiC), silicon oxynitride (SiON), silicon nitride (SiN),silicon dioxide (SiO₂), the like, and/or a combination thereof. The hardmask layer 238 may be deposited using any suitable technique, such asCVD, PECVD, ALD, PEALD, or PVD, the like, and/or a combination thereof.

Referring now to FIG. 14 , a suitable anisotropic etch (e.g., RIE) maybe used to pattern the hard mask layer 238 using the patternedphotoresist layer 239 (shown in FIG. 12 ) as an etch mask, and thatpattern may be transferred to form the TE 230, the MTJ 220, and the BE210 as illustrated in FIG. 14 using the patterned hard mask layer 238 asan etch mask. In addition, the etch process may remove the ARC 208 fromthe regions unprotected by the patterned hard mask layer 238 and recessthe third dielectric layer 206 of the dielectric stack 200. Anyremaining photoresist material may be removed by performing a surfaceclean process (e.g., an ashing process using oxygen plasma).

In FIG. 15 , dielectric spacers 34 are shown on the vertical sidewallsof the structure illustrated in FIG. 8 supported from below by therecessed horizontal surface of the third dielectric layer 206 of thedielectric stack 200. The dielectric material used in dielectric spacers34 may be silicon oxide, silicon nitride, or another suitable dielectricdeposited by acceptable deposition techniques, such as CVD, PECVD, ALD,PEALD, PVD, the like, and/or a combination thereof, and etched by anappropriate anisotropic etching technique (e.g., RIE). In someembodiments, the etching process may form the dielectric spacers 34recessed at the top thereby exposing the sides of the hard mask cover238 and a portion of the TE 230. FIG. 15 also illustrates a protectivedielectric cover layer 36 formed over the surface, in accordance withsome embodiments. The protective dielectric cover layer 36 may be formedusing dielectric materials similar to those used to form spacers 34. Insome embodiments, the protective dielectric cover layer 36 may have athickness from about 10 Å to about 3000 Å. The BE 210, the TE 230, andthe MTJ 220 are collectively referred to as an MRAM cell 240.

FIG. 16 illustrates a MRAM fill layer 38 formed adjacent to the MRAMcell 240 and filling the space in between memory cells. The MRAM filllayer 38 may be formed by depositing a dielectric material over theprotective dielectric cover layer 36 and performing a suitableplanarizing process (e.g., CMP) to remove excess materials. In someembodiments, the planarizing process removes all dielectric materialspresent over the TE 230, including a portion of protective dielectriccover layer 36 and the remaining the hard mask 238 covering the TE 230.The planarizing process may be completed once a top conductive surfaceof the topmost conductive layer 236 of TE 230 is exposed. As illustratedin FIG. 10 , after the planarizing process, a top surface is formedhaving a dielectric portion substantially coplanar with a conductiveportion. The MRAM fill layer 38 may use a suitable dielectric material,such as, SiO₂, SiON, PSG, BSG, BPSG, USG, or a low-k dielectric (e.g.,PSG, BSG, BPSG, USG, FSG, SiOCH, CDO, flowable oxide, or porous oxides(e.g., xerogels/aerogels), or the like, or a combination thereof. Thedielectric MRAM fill layer 38 may be formed using any suitable method,such as CVD, PVD, ALD, PECVD, HDP-CVD, SACVD, FCVD, spin-on, the like,and/or a combination thereof.

FIG. 17 illustrates a cross-sectional view of a third interconnect levelpositioned above the MRAM array. In FIG. 17 , this level has beenspecified as the 3^(rd) interconnect level 100C. In this example,interconnect level 100C may be formed using the same materials andmethods that were described to form the lower interconnect level 100B.The 3^(rd) interconnect level 100C is shown for illustrative purposesonly; it is understood that different interconnect levels may be formedusing the same materials and methods as the interconnect levels 100B and100C. In FIG. 17 , a via 104C and a line 108C are shown embedded in aninsulating film IMD 110C. The via 104C may be used to make electricalconnection to the top conductive surface of TE 230.

Digital data may be stored in an MTJ memory cell based on themagneto-resistive effect described below. In the embodiments describedin this disclosure, the magnetic materials used to form the free layer226 and the pinned layer 222 have a magnetic moment that may bepolarized vertically. The MTJ is programmed electrically by forcing thedirection of polarization to be either up or down by utilizing the spintorque transfer (ST) effect. During programming, the magnetic moment ofthe free layer 226 is adjusted to be either parallel or anti-parallel tothe magnetic moment of the pinned layer 222 by appropriately biasing thetop electrode 230 and the bottom electrode 210. The parallelconfiguration corresponds to a high probability for quantum mechanicaltunneling of electrons through the tunnel barrier layer 224, while theanti-parallel configuration corresponds to a low tunneling probability.The information stored as the parallel or anti-parallel state is sensedduring a read operation by sensing the magnitude of current flowingvertically through the tunnel barrier layer 224 when a cell is probedwith a relatively small electrical voltage applied between the topelectrode 230 and the bottom electrode 210. A response of a highelectrical current (low resistance) indicates a parallel state while alow electrical current (high resistance) indicates an anti-parallelstate.

The methods of forming and treating a top electrode (TE) of a magnetictunnel junction (MTJ) memory cell described above are useful forimproving device performance by preventing and/or removing sharp points,or spike point defects, on high thickness TE films, such as e.g. TiNfilms. Spike point defects may occur due to high grain size in the TEfilms produced by fabrication performed at high temperature with a longplasma deposition time. This high grain size may induce the formation ofsharp points, or spike point defects, on the TE film. Sharp points canbe prevented from being formed by deposition of the TE film in multiplesteps using low bias and high bias power. Sharp points on the topsurfaces of TE films can be removed by plasma treatments and soakingtreatments.

In accordance with an embodiment, a method of forming a semiconductorstructure includes: forming a first top electrode (TE) layer over amagnetic tunnel junction (MTJ) layer; performing a smoothing treatmenton the first TE layer, wherein the smoothing treatment is performed insitu with the forming the first TE layer; and forming additional TElayers over the first TE layer. In an embodiment, the first TE layerincludes TiN. In an embodiment, the first TE layer is formed to have athickness between about 10 nm to about 200 nm. In an embodiment, formingthe first TE layer is performed at a temperature between about 200° C.to about 400° C. In an embodiment, the performing the smoothingtreatment includes an RF plasma treatment. In an embodiment, a gas forthe RF plasma treatment is chosen from the group consisting of N₂, Ar,H₂, and O₂. In an embodiment, the RF plasma treatment is performed usingan AC bias power between about 10 W to about 1000 W. In an embodiment,the RF plasma treatment includes flowing a gas at a rate between about50 sccm to about 2000 sccm. In an embodiment, the performing thesmoothing treatment includes a gaseous soaking treatment. In anembodiment, the gaseous soaking treatment includes flowing N₂ at a ratebetween about 10 sccm to about 2000 sccm. In an embodiment, the gaseoussoaking treatment is performed at a temperature between about 200° C. toabout 600° C. In an embodiment, the gaseous soaking treatment isperformed at a pressure between about 10 mTorr to about 400 mTorr.

In accordance with another embodiment, a method of forming a magneticrandom access memory (MRAM) cell includes: forming a bottom electrodevia in a dielectric stack; forming a bottom electrode layer over thedielectric stack; forming a magnetic tunnel junction (MTJ) layer overthe bottom electrode layer; forming a first top electrode (TE) layerover the MTJ layer, the forming the first TE layer including forming afirst sublayer using a low bias power between about 0 W to about 30 Wand forming a second sublayer using a high bias power between about 20 Wto about 100 W; forming additional TE layers over the first TE layer;and after forming the TE layers, patterning the TE layers, the MTJlayer, and the bottom electrode layer to form a magnetic random accessmemory (MRAM) cell. In an embodiment, the first sublayer and the secondsublayer are formed at a temperature between about 300° C. and about400° C. and at a pressure between about 100 mtorr and about 500 mtorr.In an embodiment, the first sublayer is formed using a DC plasma powerbetween about 0 KW and about 5 KW. In an embodiment, the second sublayeris formed using a DC plasma power between about 5 KW and about 20 KW. Inan embodiment, the second sublayer is formed on the first sublayer. Inan embodiment, the method further includes forming a plurality of firstsublayers and/or a plurality of second sublayers.

In accordance with yet another embodiment, a semiconductor structureincludes: a magnetic tunnel junction (MTJ) disposed on a bottomelectrode, wherein the bottom electrode is disposed on a dielectricstack and a bottom electrode via; and a top electrode, including a firstlayer disposed on the top surface of the MTJ, the first layer includingTiN, the first layer having an order of diffraction greater than 1.4,and a second layer disposed on the first layer, the second layerincluding Ta. In an embodiment, the first layer has a thickness betweenabout 10 nm to about 200 nm.

The foregoing outlines features of several embodiments so that thoseskilled in the art may better understand the aspects of the presentdisclosure. Those skilled in the art should appreciate that they mayreadily use the present disclosure as a basis for designing or modifyingother processes and structures for carrying out the same purposes and/orachieving the same advantages of the embodiments introduced herein.Those skilled in the art should also realize that such equivalentconstructions do not depart from the spirit and scope of the presentdisclosure, and that they may make various changes, substitutions, andalterations herein without departing from the spirit and scope of thepresent disclosure.

What is claimed is:
 1. A method of forming a magnetic random accessmemory (MRAM) cell, the method comprising: forming a bottom electrodelayer; forming a magnetic tunnel junction (MTJ) layer over the bottomelectrode layer; forming a first top electrode (TE) layer over the MTJlayer, the forming the first TE layer comprising: forming a firstsublayer of a first metal using a first bias power; and forming a secondsublayer of the first metal using a second bias power, wherein thesecond bias power is greater than the first bias power; forming one ormore additional TE layers over the first TE layer; and after forming theTE layers, patterning the TE layers, the MTJ layer, and the bottomelectrode layer to form a magnetic random access memory (MRAM) cell. 2.The method of claim 1, wherein the first bias power is in a range from 0W to 30 W.
 3. The method if claim 1, wherein the second bias power is ina range from 20 W to 100 W.
 4. The method of claim 1, wherein theforming the first sublayer and the forming the second sublayer areperformed at least in part at a temperature between about 300° C. andabout 400° C. and at a pressure between about 100 mtorr and about 500mtorr.
 5. The method of claim 1, wherein the forming the first sublayeris performed at least in part using a DC plasma power between about 0 KWand about 5 KW.
 6. The method of claim 1, wherein the forming the secondsublayer is performed at least in part using a DC plasma power betweenabout 5 KW and about 20 KW.
 7. The method of claim 1, wherein theforming the second sublayer forms the second sublayer on the firstsublayer.
 8. The method of claim 1, further comprising performing asmoothing treatment on the first TE layer, wherein the smoothingtreatment is performed in situ with the forming the first TE layer, thesmoothing treatment being performed at a temperature in a range of 200°C. to 600° C.
 9. A method of forming a semiconductor structure, themethod comprising; forming a magnetic tunnel junction (MTJ) layer over abottom electrode; forming a top electrode over the MTJ layer, whereinthe forming the top electrode comprises: forming a first conductivelayer with a first conductive material, wherein the first conductivelayer is in physical contact with the MTJ layer and is free of spikepoints; forming a second conductive layer with a second conductivematerial different from the first conductive material, wherein thesecond conductive layer is in physical contact with the first conductivelayer; and forming a third conductive layer with a third conductivematerial different from both the first conductive material and thesecond conductive material, wherein the third conductive layer is inphysical contact with the second conductive layer; and surrounding thetop electrode with a dielectric material in direct physical contact withsidewalls of the first conductive layer, the second conductive layer,and the third conductive layer.
 10. The method of claim 9, wherein thefirst conductive material comprises titanium nitride.
 11. The method ofclaim 9, wherein the second conductive material comprises tantalum. 12.The method of claim 9, wherein the third conductive material comprisestantalum nitride.
 13. The method of claim 9, wherein the forming the MTJlayer comprises: forming a pinning layer over the bottom electrode;forming a tunnel barrier layer over the pinning layer; and a free layerover the tunnel barrier layer.
 14. The method of claim 9, wherein thefirst conductive layer has a thickness in a range of 10 nm to 200 nm.15. A method of forming a semiconductor device, the method comprising:forming a first conductive layer in physical contact with a top surfaceof a magnetic tunnel junction (MTJ) layer, wherein the first conductivelayer comprises titanium nitride, and wherein the first conductive layeris free of spike points; forming a second conductive layer in physicalcontact with a top surface of the first conductive layer, wherein thesecond conductive layer comprises tantalum; and forming a thirdconductive layer in physical contact with a top surface of the secondconductive layer, wherein the third conductive layer comprises tantalumnitride, wherein after the forming the third conductive layer sidewallsof the first conductive layer, the second conductive layer, and thethird conductive layer are all in physical contact with a dielectricmaterial.
 16. The method of claim 15, wherein the forming the firstconductive layer comprises performing a smoothing treatment on the firstconductive layer, wherein the smoothing treatment is performed in situwith the forming the first conductive layer.
 17. The method of claim 16,wherein the smoothing treatment is performed at a temperature in a rangeof 200° C. to 600° C.
 18. The method of claim 16, wherein the smoothingtreatment comprises an RF plasma treatment.
 19. The method of claim 18,wherein the RF plasma treatment utilizes an AC bias power in a range of10 W to 1000 W.
 20. The method of claim 16, wherein the smoothingtreatment comprises a gaseous soaking treatment.